The Artists United Will Never Be Defeated (by Institutional Applications)

12 June 2017


Venue: SET Studios, 76-89 Alscot Rd, London SE1 3AW

Organiser: Chris Alton & Liam Geary Baulch

Chris Alton is a multidisciplinary artist, whose practice often brings together distant, yet connected cultural phenomena. Whether deploying disco music against fascism or playing table tennis in competition with aggressive architecture, he utilises seemingly incongruous juxtapositions to address the multi-layered nature of prevailing social and political conditions. Liam Geary Baulch uses the structures of song, dance and costume in performances discussing climate change, activism and more. The choreographed events often involve public participation. Taking influence from folk culture and protest praxis, his work creates characters which are interesting in their internal contradictions, and provide questions about the world.

The process of applying for exhibitions or funding can be mystifying and is often carried out in isolation. Many of us hide our failures, but the rejection letters or silence of non-acceptance from art institutions can build up, leaving us feeling; frustrated, burnt-out and defeated. In response to this, Chris Alton & Liam Geary Baulch will be hosting a workshop that will de-mystify the application process, offering strategies and solidarity for the arcane process of getting your foot in the door.

Throughout the workshop, we will share our successes and our failures, collectively pooling our knowledge to learn from the experiences of others. An emphasis will be placed upon; fostering an environment of mutual care and support; group discussion and problem solving; and the deconstruction of the application process. Alongside the more ‘serious’ stuff, we’ll be having a shared lunch, singing songs and attempting to stage the ‘perfect’ application photo (everyone will leave with a few high-resolution images of themselves appearing to run a workshop, demonstrating ‘public engagement’ for future applications). Ultimately, we hope you’ll leave feeling less isolated and more informed, with regard to the application process.